发明名称 METHOD AND APPARATUS FOR MATERIAL ANALYSIS BY A FOCUSED ELECTRON BEAM USING CHARACTERISTIC X-RAYS AND BACK-SCATTERED ELECTRONS
摘要 The invention discloses a material analysis method by a focused electron beam and an equipment for performing such an analysis where an electron map B is created describing the intensity of emitted back-scattered electrons at various points on a sample, and a spectral map S is created describing the intensity of emitted X-rays at points on the sample depending on the radiation energy. For selected chemical elements, X-ray maps Mare created representing the intensity of X-rays characteristic for such elements. The X-ray maps Mand the electron map B are converted into differential X-ray maps D, which are subsequently merged into a final differential X-ray map D. The final differential X-ray map D is then used to search particles. Subsequently, a cumulative X-ray spectrum Xis calculated for each particle, wherein sample points positioned at the particle edge have lesser weight than points positioned inside the particle. Then from the cumulative spectrum Xin the course of qualitative spectroscopic analysis a concentration of chemical elements is determined in said particle.
申请公布号 EA021273(B1) 申请公布日期 2015.05.29
申请号 EA20120070260 申请日期 2012.03.06
申请人 TESCAN ORSAY HOLDING, A.S. 发明人 MOTL DAVID;DOKULILOVA SILVIE;FILIP VOJTECH
分类号 G01N23/22 主分类号 G01N23/22
代理机构 代理人
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