发明名称 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
摘要 An illumination system of a microlithographic projection exposure apparatus includes an optical integrator having a plurality of light entrance facets each being associated with a secondary light source. A spatial light modulator has a light exit surface and transmit or to reflect impinging projection light in a spatially resolved manner. A pupil forming unit directs projection light on the spatial light modulator. An objective images the light exit surface of the spatial light modulator onto the light entrance facets of the optical integrator. The light exit surface of the optical light modulator includes groups of object areas being separated by areas that are not imaged on the light entrance facets. The objective combines images of the object areas so that the images of the object areas abut on the optical integrator.
申请公布号 US2015146183(A1) 申请公布日期 2015.05.28
申请号 US201414543079 申请日期 2014.11.17
申请人 Carl Zeiss SMT GmbH 发明人 Deguenther Markus;Davydenko Vladimir;Korb Thomas;Schlesener Frank;Hilt Stefanie;Hoegele Wolfgang
分类号 G03F7/20;G02B26/08 主分类号 G03F7/20
代理机构 代理人
主权项 1. An illumination system having a pupil plane, the illumination system comprising: an optical integrator configured so that, during use of the illumination system, the optical integrator produces a plurality of secondary light sources in the pupil plane, the optical integrator comprising a plurality of light entrance facets, each light entrance facet being associated with a secondary light source; a spatial light modulator having a light exit surface, the spatial light modulator configured so that, during use of the illumination system, the spatial light modulator transmits or reflects impinging projection light in a spatially resolved manner; a pupil forming unit configured so that, during use of the illumination system, the pupil forming unit directs projection light onto the spatial light modulator; an objective configured so that, during use of the illumination system, the objective images the light exit surface of the spatial light modulator onto the light entrance facets of the optical integrator; and a control unit configured so that, during use of the illumination system, the control unit controls the pupil forming unit and the spatial light modulator, wherein: the light exit surface of the optical light modulator comprises groups of object areas which are separated by areas that are not imaged on the light entrance facets during use of the illumination system;the objective is configured so that, during use of the illumination system, the objective combines images of the object areas so that the images of the object areas abut on the optical integrator; andthe illumination system is a microlithographic illumination system.
地址 Oberkochen DE
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