MOLECULAR BEAM ENHANCED GCIB TREATMENT

摘要

A method and system for performing gas cluster ion beam (GCIB) etch processing of various materials is described. In particular, the GCIB etch processing includes using one or more molecular beams to optimize pressure at localized regions of the ion beam.

主权项

1. A gas cluster ion beam (GCIB) system, comprising:
a vacuum processing system; a gas cluster ion beam (GCIB) generating system configured to generate a GCIB in said vacuum processing system; a molecular beam generating system configured to generate a molecular beam in said vacuum processing system; a substrate holder configured to hold a substrate in a substrate plane, and positioned to intersect said substrate with said GCIB; and a scanning system coupled to said substrate holder, and configured to scan said substrate through said GCIB such that said GCIB intersects said substrate.