发明名称 |
SIMULATION METHOD, SIMULATION PROGRAM, PROCESSING APPARATUS, SIMULATOR, AND DESIGN METHOD |
摘要 |
A simulation method includes acquiring a processing condition for performing predetermined processing on a processing target with use of plasma, calculating a solid angle corresponding to a field-of-view region through which plasma space is viewable from a predetermined evaluation point in the predetermined evaluation point on a surface of the processing target based on the processing condition, and calculating an incident radical amount entering the evaluation point by a flux method with use of a function which takes a reaction probability between the solid angle and the evaluation point of a radical entering the evaluation point as an argument. |
申请公布号 |
US2015149131(A1) |
申请公布日期 |
2015.05.28 |
申请号 |
US201414522041 |
申请日期 |
2014.10.23 |
申请人 |
Sony Corporation |
发明人 |
Kuboi Nobuyuki;Kinoshita Takashi |
分类号 |
G06F17/50;G06N7/00 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
1. A simulation method, comprising:
acquiring a processing condition for performing predetermined processing on a processing target with use of plasma; calculating a solid angle corresponding to a field-of-view region through which plasma space is viewable from a predetermined evaluation point in the predetermined evaluation point on a surface of the processing target based on the processing condition; and calculating an incident radical amount entering the evaluation point by a flux method with use of a function which takes a reaction probability between the solid angle and the evaluation point of a radical entering the evaluation point as an argument. |
地址 |
Tokyo JP |