发明名称 SIMULATION METHOD, SIMULATION PROGRAM, PROCESSING APPARATUS, SIMULATOR, AND DESIGN METHOD
摘要 A simulation method includes acquiring a processing condition for performing predetermined processing on a processing target with use of plasma, calculating a solid angle corresponding to a field-of-view region through which plasma space is viewable from a predetermined evaluation point in the predetermined evaluation point on a surface of the processing target based on the processing condition, and calculating an incident radical amount entering the evaluation point by a flux method with use of a function which takes a reaction probability between the solid angle and the evaluation point of a radical entering the evaluation point as an argument.
申请公布号 US2015149131(A1) 申请公布日期 2015.05.28
申请号 US201414522041 申请日期 2014.10.23
申请人 Sony Corporation 发明人 Kuboi Nobuyuki;Kinoshita Takashi
分类号 G06F17/50;G06N7/00 主分类号 G06F17/50
代理机构 代理人
主权项 1. A simulation method, comprising: acquiring a processing condition for performing predetermined processing on a processing target with use of plasma; calculating a solid angle corresponding to a field-of-view region through which plasma space is viewable from a predetermined evaluation point in the predetermined evaluation point on a surface of the processing target based on the processing condition; and calculating an incident radical amount entering the evaluation point by a flux method with use of a function which takes a reaction probability between the solid angle and the evaluation point of a radical entering the evaluation point as an argument.
地址 Tokyo JP