| 发明名称 |
LASER PROCESSING OF SUPERCONDUCTOR LAYERS |
| 摘要 |
A method of forming a superconductor includes exposing a layer disposed on a substrate to an oxygen ambient, and selectively annealing a portion of the layer to form a superconducting region within the layer. |
| 申请公布号 |
US2015148236(A1) |
申请公布日期 |
2015.05.28 |
| 申请号 |
US201314092296 |
申请日期 |
2013.11.27 |
| 申请人 |
Varian Semiconductor Equipment Associates, Inc. |
发明人 |
Wang Connie P.;Murphy Paul;Sullivan Paul;Chatterjee Sukti |
| 分类号 |
H01L39/24;H02H9/02;H01L39/12 |
主分类号 |
H01L39/24 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of forming a superconductor, the method comprising
exposing a layer disposed on a substrate to an oxygen ambient; and selectively annealing a portion of the layer to form a superconducting region within the layer. |
| 地址 |
Gloucester MA US |
