METHODS AND MEDIA FOR AVERAGING CONTOURS OF WAFER FEATURE EDGES

摘要

A method of determining an average contour of a patterned feature on a wafer includes providing a reference contour corresponding to the patterned feature on the wafer, providing a plurality of images of the patterned feature, extracting from the plurality of images a plurality of extracted contours that represent the patterned feature, eliminating flyers from the plurality of extracted contours, and generating the average contour of the patterned feature based on the extracted contours remaining after elimination of the flyers.

主权项

1. A method of determining an average contour of a patterned feature of a wafer, the method comprising:
providing a reference contour corresponding to the patterned feature on the wafer; providing a plurality of images of the patterned feature; extracting from the plurality of images a plurality of extracted contours that represent the patterned feature; eliminating flyers from the plurality of extracted contours; and generating the average contour of the patterned feature based on the extracted contours remaining after elimination of the flyers.