METHOD FOR ADJUSTING COMPENSATING OPTICAL SYSTEM AND COMPENSATING OPTICAL SYSTEM

摘要

A positional deviation between a phase distribution in a wavefront sensor and a compensation phase pattern in a wavefront modulator is corrected in a short time and with high accuracy by a method including a first step of causing the wavefront modulator to display a singularity generation pattern, a second step of measuring in the sensor an adjustment wavefront shape when an optical image modulated by the singularity generation pattern enters the wavefront sensor, a third step of detecting a position of a singularity in the adjustment wavefront shape from a measurement result in the sensor, and a fourth step of adjusting a positional deviation between a wavefront shape measured in the wavefront sensor and a compensation pattern displayed on the wavefront modulator based on a positional deviation of the position of the singularity.

主权项

1. A method for adjusting an adaptive optics system which includes a wavefront modulator receiving an optical image from a light source or an observation object, and a wavefront sensor receiving an optical image from the wavefront modulator to measure a wavefront shape of the optical image, and compensates for a wavefront distortion by controlling a pattern to be displayed on the wavefront modulator based on the wavefront shape measured by the wavefront sensor, comprising:
a first step of causing the wavefront modulator to display a singularity generation pattern which is a pattern including a singularity at a predetermined position; a second step of measuring in the wavefront sensor an adjustment wavefront shape which is a wavefront shape when an optical image modulated by the singularity generation pattern enters the wavefront sensor; a third step of detecting a position of the singularity in the adjustment wavefront shape from a measurement result in the wavefront sensor; and a fourth step of adjusting a positional deviation between a wavefront shape measured in the wavefront sensor and a compensation pattern displayed on the wavefront modulator based on a positional deviation of the position of the singularity detected in the third step with respect to the predetermined position.