发明名称 SEMICONDUCTOR PROCESSING APPARATUS WITH A CERAMIC-COMPRISING SURFACE WHICH EXHIBITS FRACTURE TOUGHNESS AND HALOGEN PLASMA RESISTANCE
摘要 A solid solution-comprising ceramic article useful in semiconductor processing, which article may be in the form of a solid, bulk ceramic, or may be in the form of a substrate having a ceramic coating of the same composition as the bulk ceramic material on at least one outer surface. The ceramic article is resistant to erosion by halogen-containing plasmas and provides advantageous mechanical properties. The solid solution-comprising ceramic article is formed from a combination of yttrium oxide and zirconium oxide. The ceramic-comprising article includes ceramic which is formed from zirconium oxide at a molar concentration ranging from about 96 mole % to about 91 mole %, and yttrium oxide at a molar concentration ranging from about 4 mole % to about 9 mole %.
申请公布号 US2015143677(A1) 申请公布日期 2015.05.28
申请号 US201313998723 申请日期 2013.11.26
申请人 Sun Jennifer Y.;Duan Ren-Guan;Yuan Jie;Xu Li;Collins Kenneth S. 发明人 Sun Jennifer Y.;Duan Ren-Guan;Yuan Jie;Xu Li;Collins Kenneth S.
分类号 H01L21/67 主分类号 H01L21/67
代理机构 代理人
主权项
地址 Sunnyvale CA US