发明名称 |
FREE-STANDING SILICON OXIDE MEMBRANES AND METHODS OF MAKING AND USING SAME |
摘要 |
Provided is a free-standing silicon oxide film that is under tensile stress. Also, provided are methods of making a free-standing silicon oxide film that is under tensile stress. The methods use low-power PECVD deposition of silicon oxide. Methods of imaging one or more objects (e.g., cells) using a free-standing silicon oxide film that is under tensile stress is also provided. |
申请公布号 |
WO2015077324(A1) |
申请公布日期 |
2015.05.28 |
申请号 |
WO2014US66383 |
申请日期 |
2014.11.19 |
申请人 |
SIMPORE INC. |
发明人 |
DESORMEAUX, JON-PAUL;STRIEMER, CHRISTOPHER, C. |
分类号 |
B05D3/12;B05D5/06;C23C16/453;H05H1/42 |
主分类号 |
B05D3/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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