发明名称 HIGH DENSITY LINEAR CAPACITOR
摘要 A methods for fabricating a capacitor structure includes fabricating polysilicon structures (PO) on a semiconductor substrate. The method further includes fabricating Ml to diffusion (MD) interconnects on the semiconductor substrate. The polysilicon structures are disposed in an interleaved arrangement with the MD interconnects. The method also includes selectively connecting the interleaved arrangement of the MD interconnects and/or the polysilicon structures as the capacitor structure.
申请公布号 WO2015076926(A1) 申请公布日期 2015.05.28
申请号 WO2014US57017 申请日期 2014.09.23
申请人 QUALCOMM INCORPORATED 发明人 LEE, BRUCE SOKKI;BAZARJANI, SEYFOLLAH SEYFOLLAHI;DAI, LIANG
分类号 H01L49/02;H01L23/522;H01L27/07 主分类号 H01L49/02
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