| 摘要 |
This invention provides a light-curable imprinting-resin composition that excels in terms of both transfer performance during imprinting and the solvent resistance of a pattern transferred to a structure. Said light-curable imprinting-resin composition contains, at least, photopolymerizable (meth)acrylic monomers (A) and a photoinitiator (B). Said (meth)acrylic monomers (A) consist of (a-1) 60-97 mass% of a trifunctional (meth)acrylate compound, (a-2) 3-40 mass% of a (meth)acrylate compound having four or more bonding sites, and (a-3) 0-37 mass% of a (meth)acrylate compound having two or fewer bonding sites (with the proportions of compounds (a-1) through (a-3) totaling 100 mass%). |
