发明名称 ANTIFUSE OF SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
摘要 An antifuse of a semiconductor device and a method of fabricating the same capable of causing an antifuse to stably operate by rupturing the antifuse at a specific point and stabilizing a current level when rupturing the antifuse are provided. The antifuse may include: a device isolation layer defining a first active region in a semiconductor substrate; a first and second junction regions provided in the first active region; a second active region formed over the first junction region; a gate insulating layer formed over the first active region and the second active region; and a gate electrode formed over the gate insulating layer.
申请公布号 US2015147859(A1) 申请公布日期 2015.05.28
申请号 US201514608141 申请日期 2015.01.28
申请人 SK hynix Inc. 发明人 HONG Yeong Eui
分类号 H01L27/112;H01L21/266;H01L21/02;H01L21/28;H01L21/311 主分类号 H01L27/112
代理机构 代理人
主权项
地址 Icheon KR
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