APPARATUS OF CLEANING SUBSTRATE

摘要

A substrate cleaning system comprises a main cleaning room, a first cleaning nozzle, a cover member, an air flow generating unit, and an exhaust unit. The main cleaning room has a cleaning space in which the substrate is cleaned and a side wall equipped with a first ventilation hole. The first cleaning nozzle is placed in the main cleaning room to spray out a first cleaning solution. The cover member covers the main cleaning room and has a second ventilation hole on one side. The air flow generating unit supplies the air into the cleaning space through the first ventilation hole. The exhaust unit is connected to one side of the cover member to inhale and exhaust the air supplied into the cleaning space through the second ventilation hole.