发明名称 SAMPLE MEASURING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To solve the problem that a potential of a sample is varied when dealing with a positional shift caused by a deflection of a primary electron beam generated at the time of measuring the vicinity of an outer edge of the sample by controlling a potential of a correcting electrode provided outside the sample.SOLUTION: The sample measuring device comprises: a retarding voltage applying part 26 that applies a retarding voltage to a sample 10; a first and a second electrodes 32-1 and 32-2 for making the sample be adsorbed to a sample stand 11; a third electrode 44-1 provided so that the inner edge thereof is further outside than the outer edge of the sample; a fourth electrode 44-2 provided between the second electrode and the third electrode; a first, a second and a third voltage applying parts 38-1, 39-2 and 48 that apply voltages to the first, the second and the third electrodes respectively; and a control part that controls the voltage applied from the third voltage applying part, where a voltage is applied to the fourth electrode by the retarding voltage applying part 26. The device can reduce disorder of potential distribution outside the vicinity of the sample and variation of the potential of the sample while reducing positional shifts generated when measuring the vicinity of the outer periphery of the sample.</p>
申请公布号 JP2015099701(A) 申请公布日期 2015.05.28
申请号 JP20130239176 申请日期 2013.11.19
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MIYA TAKESHI;SUGANO SEIICHIRO;EBIZUKA YASUSHI;ISHIGAKI NAOYA;YASUKOCHI MASAYA;TAKAHASHI MASAKAZU;MIWA TAKAFUMI
分类号 H01J37/20;H01J37/28;H01L21/683 主分类号 H01J37/20
代理机构 代理人
主权项
地址