MONITOR SYSTEM AND METHOD FOR SEMICONDUCTOR PROCESSES

摘要

A method for monitoring a process in a semiconductor processing facility and a monitor system are provided. A plurality of wafers are processed according to a process. Data on the processing is collected, and the collecting includes, for each wafer of the plurality of wafers, determining that a processing event has occurred, and recording a time associated with the processing event. An amount of time between the recorded times is calculated for consecutively processed wafers. A set of control limits for the process is determined based on the calculated amounts of time. The set of control limits define a range of acceptable values for the amount of time. Second wafers are processed according to the process. A problem in the processing of the second wafers is identified based on the set of control limits. The problem is identified as the second wafers are being processed.

主权项

1. A method for monitoring a process in a semiconductor processing facility, the method comprising:
processing a plurality of wafers according to a process; collecting data on the processing, wherein the collecting includes, for each wafer of the plurality of wafers:
determining that a processing event has occurred, andrecording a time associated with the processing event; for consecutively processed wafers of the plurality of wafers, calculating an amount of time between the recorded times; determining a set of control limits for the process based on the calculated amounts of time, the set of control limits defining a range of acceptable values for the amount of time; and processing second wafers according to the process, wherein a problem in the processing of the second wafers is identified based on the set of control limits, and wherein the problem is identified as the second wafers are being processed.