OPTIMIZING LITHOGRAPHY MASKS FOR VLSI CHIP DESIGN

摘要

In one embodiment, a computer-implemented method includes accessing mask input data. The mask input data includes a mathematical representation of a mask in a mask representation space, where the mask is configured to create an integrated circuit microprocessor. A set of values is obtained based on a derivative of the mask input data. The set of values is optimized, by a computer processor, in a derivative domain to obtain optimized mask data. The optimized mask data is transformed into the mask representation space to obtain printable mask output data.

主权项

1. A computer-implemented method, comprising:
accessing mask input data, comprising a mathematical representation of a mask in a mask representation space, wherein the mask is configured to create an integrated circuit microprocessor; transforming the mask input data into a derivative domain by calculating a derivative of the mask input data; obtaining a set of values based on the derivative of the mask input data; optimizing, by a computer processor, the set of values in the derivative domain of the mask input data to obtain optimized mask data; and transforming the optimized mask data into the mask representation space to obtain printable mask output data.