| 摘要 |
Provided are an array substrate and a preparation method therefor, and a display device, which relate to the technical field of displays and can reduce the frequency of patterning processes and save costs. The method comprises: forming, on an underlayment substrate (10), a pattern layer (201a) comprising a pixel electrode (20), and a pattern layer comprising a gate electrode (30) and a gate line via one patterning process; forming, on the substrate (10) on which the pattern layer comprising the gate electrode (30) and the gate line is formed, via two patterning processes at the most, a gate insulating layer (401), a pattern layer at least comprising a metal oxide semiconductor active layer (50), and a pattern layer at least comprising an etching blocking layer (601), wherein a first via hole (71) exposing the pixel electrode (20) is formed above the pixel electrode (20); and forming, on the substrate (10) on which the etching blocking layer (601) is formed, a pattern layer comprising a source electrode (80a), a drain electrode (80b) and data line via one patterning process, wherein both the source electrode (80a) and the drain electrode (80b) are in contact with the metal oxide semiconductor active layer (50), and the drain electrode (80b) is electrically connected with the pixel electrode (20) via the first via hole (71). |
