| 摘要 |
PROBLEM TO BE SOLVED: To provide a development method capable of suppressing the consumption amount of developer.SOLUTION: A development apparatus for developing a substrate W comprises: a spin chuck for holding the substrate W in a rotatable manner; a developer nozzle 11 in which a plurality of discharge ports a0, a1, and a2 (called simply discharge ports (a) hereafter) for discharging developer are formed side by side in one row and the developer discharged from each discharge port (a) is deposited to the substrate W while being separated from each other; a horizontal move mechanism 21 for moving the developer nozzle 11 between approximately a center and an edge of the substrate W in a planar view by moving the developer nozzle 11 in one direction toward the center of the substrate W in a planar view while keeping an arrangement direction d1 of the discharge ports (a) in the one direction; and a control section for developing the substrate W by spirally depositing the developer from the discharge ports (a) onto the substrate W, respectively, while controlling the spin chuck and the horizontal move mechanism 21. |
