CLEANING METHOD FOR POLYIMIDE FILM FORMATION DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a cleaning method for a polyimide film formation device capable of removing polyimide adhered to the inside of the device with ease.SOLUTION: A cleaning method for a polyimide film formation device of removing polyimide adhered to the inside of the device by a deposition step of depositing a polyimide film on a plurality of processing bodies housed in a reaction chamber, includes: a cleaning step of supplying oxygen into the reaction chamber and applying a high-frequency power to the inside of the reaction chamber to perform plasma excitation of oxygen, and making the plasma-excited oxygen be contacted with the polyimide adhered to the inside of the device to remove the polyimide.