发明名称 GAS PROCESSING DEVICE AND EXHAUST GAS PROCESSING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a gas processing device which processes a high temperature processed gas with a gas which is prone to be thermally decomposed.SOLUTION: A gas processing device of the invention includes: a processed gas passage in which a processed gas flows; and a sprayer. The sprayer includes: a spray nozzle having a first opening from which droplets of a first liquid is jetted with a first gas; and a second opening which is provided at a periphery of the spray nozzle and jets a second gas. At least a part of the sprayer is disposed in the processed gas passage so that the droplets of the first liquid, the first gas, and the second gas are jetted into the processed gas.</p>
申请公布号 JP2015097987(A) 申请公布日期 2015.05.28
申请号 JP20130238845 申请日期 2013.11.19
申请人 OSAKA PREFECTURE UNIV;NIHON YAMAMURA GLASS CO LTD 发明人 KUROKI TOMOYUKI;OKUBO MASAAKI;FUJISHIMA HIDEKATSU;YAMAMOTO HASHIRA;TORII TOYOHIKO;FUJIMOTO NAOYUKI
分类号 B01D53/56;B01D53/18;B01D53/50;B01D53/77;B05B7/04;B05B7/08 主分类号 B01D53/56
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