| 摘要 |
<p>Systems for cleaning substrates including cleaning of semiconductor substrates, use atmospheric or sub-atmospheric ultraviolet (UV) light to improve selectivity of conventional wet chemical cleaning in the manufacture of semiconductor devices. The UV light systems are configured to improve front-end-of-line (FEOL) (e.g., non-metal) or back-end-of-line (BEOL) (e.g., metal) removal of etch by-products (e.g., polymers) and/or mask layers from underlying materials. Systems herein can be configured with multiple lamps that irradiate substrates, gasses, and liquids at different bandwidths. Selectivity and queue time is improved while reducing processing temperatures.</p> |
