发明名称 NANOWIRE MOSFET WITH DIFFERENT SILICIDES ON SOURCE AND DRAIN
摘要 A nanowire field effect transistor (FET) device and method for forming a nanowire FET device are provided. A nanowire FET including a source region and a drain region is formed. The nanowire FET further includes a nanowire that connects the source region and the drain region. A source silicide is formed on the source region, and a drain silicide is formed on the drain region. The source silicide is comprised of a first material that is different from a second material comprising the drain silicide.
申请公布号 KR20150057962(A) 申请公布日期 2015.05.28
申请号 KR20140124286 申请日期 2014.09.18
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 COLINGE JEAN PIERRE;LIN CHENG TUNG;CHING KUO CHENG;DIAZ CARLOS H.
分类号 H01L21/335;H01L21/24;H01L29/78 主分类号 H01L21/335
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