A METHOD OF FORMING A DEVICE

摘要

The present invention relates to a method of forming a device, more particularly the present invention relates to a method of forming a graphene device by effectively transferring a graphene layer comprising the steps of providing at least a first material (11) layer, depositing at least a second material (12) layer on said at least a first material (11) layer, and depositing at least a catalyst layer (21) on said at least a second material (12) layer for forming nanostructures (22), etching said at least a first material (11) layer, and transferring remaining layers of said at least a second material (12) layer with nanostructures (22) onto at least a substrate (13).