ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

摘要

An illumination system of a microlithographic projection exposure apparatus (10) comprises a pupil forming unit (36) directing light on a spatial light modulator (52) that transmits or reflects impinging light in a spatially resolved manner. An objective (58) images a light exit surface (57) of the spatial light modulator (52) on light entrance facets (75) of an optical integrator (60) so that an image (110') of an object area (110) on the light exit surface (57) completely coincides with one of the light entrance facets. The pupil forming unit (36) and the spatial light modulator (52) are controlled so that the object area (110) is completely illuminated by the pupil forming unit (36) and projection light associated with a point in the object area (110) is at least partially and variably prevented from impinging on the one of the light entrance facets (75).