| 摘要 |
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by formula (b1-1), a compound represented by formula (b1-1′) and/or a compound represented by formula (b1-1′′). In Chemical Formula 1 according to the present invention, R^1′′-R^3′′ represents an aryl group or an alkyl group, at least one of R^1′′-R^3′′ represents a substituted aryl group being substituted with a group represented by formula (b1-1-0), and two of R^1′′-R^3′′ may be mutually bonded to form a ring with the sulfur atom. X represents a C3-C30 hydrocarbon group, Q^1 represents a carbonyl group-containing divalent linking group, P represents an integer of 1 to 3. X^10 represents a C1-C30 hydrocarbon group, Q^3 represents a single bond or a divalent linking group, Y^10 represents -C(=O)- or -SO_2-, Y^11 represents a C1-C10 alkyl group or a fluorinated alkyl group. Q^2 represents a single bond or an alkylene group. and W represents a C2-C10 alkylene group. |
