| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To avoid multiple exposure due to stray light when exposing a semiconductor pattern using an exposure mask. <P>SOLUTION: A cover film is formed integrally with a pellicle so as to avoid a reticle exposure region where an exposure pattern is formed, and transmits visible light but does not transmit ultraviolet light. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
