发明名称 半導体装置
摘要 <p>PROBLEM TO BE SOLVED: To prevent malfunction of a circuit due to a displacement current which charges or discharges a parasitic capacitor composed of an insulating film between a supporting substrate and an active layer by a dv/dt surge.SOLUTION: On the outer periphery of isolated semiconductor elements constituting a low potential reference circuit LV and a high potential reference circuit HV, an n-type guard ring 42c, and the like, are formed, and a deep n-type diffusion region 42b having the same conductivity type as that of the n-type guard ring buried layer 42c is formed on the buried insulating film 2b side of an active layer 2c. Furthermore, a p-type well 42d, and the like, are formed in an n-type layer 42a, and the like, composed of the active layer 2c, and a semiconductor element is formed in the p-type well 42d. Potentials of the n-type guard ring 42c, and the like, and the p-type well 42d, and the like, are fixed to become reverse bias or the same potential, respectively.</p>
申请公布号 JP5725230(B2) 申请公布日期 2015.05.27
申请号 JP20140080239 申请日期 2014.04.09
申请人 发明人
分类号 H01L27/08;H01L21/762;H01L21/822;H01L21/8234;H01L27/04;H01L27/06;H01L29/06;H01L29/861;H01L29/868 主分类号 H01L27/08
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