| 摘要 |
<p>The present invention is aiming to provide a irregular-surface forming method using a plasma-etching process which could stably and precisely provide a substrate having predetermined surface irregularities, and an electrode component obtained by the forming method therefrom. Thus, the present invention relates to method of forming a predetermined irregular-surface pattern on a substrate, wherein a plasma-etching process is carried out using a partly oxidized metal salt film having fine irregular-surface as a resist, comprising the following processes (1) to (3);
(1)in the first process, a metal salt film is formed on the substrate by coating a liquid material containing a metal salt.
(2)in the second process, a fine irregular-surface is formed on the metal salt film, and the metal salt film was converted into the resist by the partial oxidization.
(3)in the third process, a predetermined irregular-surface is formed on the substrate by carrying out the plasma-etching process to the substrate with the resist.</p> |
