| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a dry film resist thinning processing method that can uniformly reduce the thicknesses of dry film resists. <P>SOLUTION: The dry film resist thinning processing method includes: a processing step of processing a dry film resist adhered on a substrate with a processing solution; and a step of removing an unnecessary part of the dry film resist on the surface after performing the processing step. In the method, the unnecessary part of the dry film resist is processed with a potassium salt solution with a concentration higher than that of the processing solution before being removed. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
