发明名称 Ink transfer subsystem for a variable data lithography system
摘要 <p>An improved imaging member for a variable data lithography system comprises a reimageable surface layer comprising a polymer, the reimageable surface having a surface roughness Ra in the range of 0.10-4.0 µm peak-to-valley, and peak-to-valley nearest neighbor average distances finer than 20 µm. A structural mounting layer may be provided to which the reimageable surface layer is attached, either directly or with intermediate layers therebetween. The relatively rough surface facilitates retention of dampening solution and improves inking uniformity and transfer. The reimageable surface layer may be comprised of polydimethylsiloxane (silicone), and may optionally have particulate radiation sensitive material disbursed therein to promote absorption, and hence heating, from an optical source.</p>
申请公布号 EP2447067(B1) 申请公布日期 2015.05.27
申请号 EP20110187192 申请日期 2011.10.28
申请人 PALO ALTO RESEARCH CENTER INCORPORATED 发明人 STOWE, TIMOTHY D.;PATTEKAR, ASHISH
分类号 B41F7/00;B41C1/10;B41F31/00;B41F31/02;B41F35/02;B41N3/00 主分类号 B41F7/00
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