| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an exposure apparatus or the like that performs various measurements by receiving exposing light from a projection optical system even when the number of apertures of the projection optical system increases. <P>SOLUTION: A sensor 40 is configured such that it includes a plano-convex lens 41 and a photodetector 42. An optical shielding portion 43 and a light transmitting portion 44 are formed by depositing Cr (chromium) in a flat portion 41a of the plano-convex lens 41. The plano-convex lens 41 is arranged so that a top surface may accord with a top surface 15a of a wafer stage. A liquid w is supplied to a location between a projection optical system PL and the plano-convex lens 41, and an exposing light, among exposing lights incident to the liquid w from the projection optical system PL, incident to the light transmitting portion 44 is entered into the plano-convex lens 41 and converged without passing through gas. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
