Cleaning subsystem for a variable data lithography system

摘要

An cleaning subsystem for a variable data lithography system includes a first cleaning member having a conformable adhesive surface disposed for physical contact with an imaging member such that residual ink remaining on the imaging member, such as following transfer of an inked latent image from the imaging member to a substrate, adheres to the conformable adhesive surface and is thereby removed from the imaging member. The cleaning subsystem may further include a second cleaning member, in physical contact with the first cleaning member, having a relatively hard, smooth surface such that residual ink removed from the imaging member and adhering to the adhesive surface of the first cleaning member may split onto the second cleaning member.