| 摘要 |
In an upper main body (21) of a sample holder (20), a laminate of an insulative thin film (11) and a secondary electron emission protective thin film (12) is provided. An electron beam (41) emitted from an electron gun (40) enters the secondary electron emission protective thin film side. The undersurface of the insulative thin film (11) is a sample adhesion surface, where a sample (30) to be an observation target is held by adsorption or the like. The secondary electron emission protective thin film (12) is made of a material having a low secondary electron emission coefficient ´ and, preferably, is non-insulative. That is, the secondary electron emission protective thin film (12) is conductive even though the electric resistance is high. Accordingly, the charge level of a site irradiated with the electron beam has a low charge level. |
