| 摘要 |
A gas processing device is disclosed that makes it possible to appropriately control the frictional resistance between a holding mat and a casing. A gas processing device (1) includes a processing structure (20), a casing (40) made of a metal and housing the processing structure (20), and a holding mat (10) formed of inorganic fibers and placed between the processing structure (20) and the casing (40), an inner surface (41) of the casing (40) and an outer surface (11) of the holding mat (10) coming in contact with each other through an adhesive layer (12) that includes a compound that includes a structural unit represented by a general formula (I).
wherein R 1 are independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, a phenyl group, or a hydroxyl group, and n is an integer equal to or larger than 1. |
