发明名称 Inorganic nanocoating primed organic film
摘要 An inorganic nanolayer surface coated polymer film product is disclosed with enhancements such as improved metallization capability, low cost, low polymer additives and modifiers, improved recyclability, and good web properties. Also method for priming a flexible film substrate to enhance the reactivity or wettability of the substrate for metallization is disclosed. A substrate film is coated with one or more nanolayers of a metal or metal oxide applied by CCVD and/or PECVD at open atmosphere. The deposited coating acts to enhance the surface energy of the film substrate and to and reduce the surface gauge variation of the substrate or supporting film, thereby enhancing the wettability of the film substrate for metallization and/or to improve the anti-block characteristics of the film. The deposited coatings may also act as a barrier layer for lowering the permeability of light, gas and vapor transmission through the substrate.
申请公布号 US9040120(B2) 申请公布日期 2015.05.26
申请号 US201113204483 申请日期 2011.08.05
申请人 FRITO-LAY NORTH AMERICA, INC. 发明人 Hunt Andrew;Jiang Yongdong;Laverdure Kenneth Scott;Knoerzer Anthony Robert
分类号 C23C16/00;C23C16/40;C23C16/02;C23C16/50;C23C14/02;C23C16/453 主分类号 C23C16/00
代理机构 Carstens & Cahoon, LLP 代理人 Cahoon Colin P.;Gourley James R.;Carstens & Cahoon, LLP
主权项 1. A method comprising: a) forming a coextruded organic film substrate by a co-extrusion process; b) depositing a first inorganic nanocoating layer directly on to a surface of the film substrate at open atmosphere to enhance the wettability of the film substrate for metallization, wherein the first inorganic nanocoating layer is silica, and wherein the inorganic nanocoating layer is deposited on to at least one surface of the film substrate prior to all winding and deposited in a process that is inline with the coextrusion process, wherein the inorganic nanocoating layer is less than 8 nm in average thickness; and wherein the surface roughness of the inorganic nanocoating layer is characterized by root mean square value of less than about 5 nm; and c) depositing a metal layer directly on the first inorganic nanocoating layer by a vacuum metallization process to produce a coated film substrate, wherein the metal layer is not a metal oxide layer, wherein the metal layer is aluminum, and wherein the metal layer has a thickness from about 5 to about 50 nm.
地址 Plano TX US