发明名称 |
Molded interposer package and method for fabricating the same |
摘要 |
A method for fabricating a molded interposer package includes performing a first anisotropic etching process to remove a portion of the metal sheet from a top surface of the metal sheet, thereby forming a plurality of first recesses in the metal sheet, forming a molding material covering the top surface, filling the first recesses, forming a plurality of first via openings in the molding material, wherein the first via openings expose the top surface, forming a plurality of first metal vias in the first via openings and a plurality of first redistribution layer patterns respectively on the first metal vias, performing a second anisotropic etching process to remove a portion of the metal sheet from a bottom surface of the metal sheet until a bottom of the molding material is exposed, and forming a solder mask layer on the molding material, leaving the first redistribution layer patterns exposed. |
申请公布号 |
US9040359(B2) |
申请公布日期 |
2015.05.26 |
申请号 |
US201414482112 |
申请日期 |
2014.09.10 |
申请人 |
MEDIATEK INC. |
发明人 |
Gregorich Thomas Matthew;Chang Andrew C.;Lin Tzu-Hung |
分类号 |
H01L21/00;H01L21/4763;H01L27/08;H01L23/48;H01L23/00;H01L25/065;H01L25/10;H01L21/56;H01L23/367;H01L23/498;H01L23/31 |
主分类号 |
H01L21/00 |
代理机构 |
McClure, Qualey & Rodack, LLP |
代理人 |
McClure, Qualey & Rodack, LLP |
主权项 |
1. A method for fabricating a molded interposer package, comprising:
providing a metal sheet having a top surface and a bottom surface; performing a first anisotropic etching process to remove a portion of the metal sheet from the top surface of the metal sheet, thereby forming a plurality of first recesses in the metal sheet; forming a molding material covering the top surface of the metal sheet, filling the first recesses; forming a plurality of first via openings in the molding material, wherein the first via openings expose the top surface of the metal sheet; forming a plurality of first metal vias in the first via openings and a plurality of first redistribution layer patterns respectively on the first metal vias; performing a second anisotropic etching process to remove a portion of the metal sheet from the bottom surface of the metal sheet until a bottom of the molding material is exposed; and forming a solder mask layer on the molding material, leaving the first redistribution layer patterns exposed. |
地址 |
Hsin-Chu TW |