发明名称 Molded interposer package and method for fabricating the same
摘要 A method for fabricating a molded interposer package includes performing a first anisotropic etching process to remove a portion of the metal sheet from a top surface of the metal sheet, thereby forming a plurality of first recesses in the metal sheet, forming a molding material covering the top surface, filling the first recesses, forming a plurality of first via openings in the molding material, wherein the first via openings expose the top surface, forming a plurality of first metal vias in the first via openings and a plurality of first redistribution layer patterns respectively on the first metal vias, performing a second anisotropic etching process to remove a portion of the metal sheet from a bottom surface of the metal sheet until a bottom of the molding material is exposed, and forming a solder mask layer on the molding material, leaving the first redistribution layer patterns exposed.
申请公布号 US9040359(B2) 申请公布日期 2015.05.26
申请号 US201414482112 申请日期 2014.09.10
申请人 MEDIATEK INC. 发明人 Gregorich Thomas Matthew;Chang Andrew C.;Lin Tzu-Hung
分类号 H01L21/00;H01L21/4763;H01L27/08;H01L23/48;H01L23/00;H01L25/065;H01L25/10;H01L21/56;H01L23/367;H01L23/498;H01L23/31 主分类号 H01L21/00
代理机构 McClure, Qualey & Rodack, LLP 代理人 McClure, Qualey & Rodack, LLP
主权项 1. A method for fabricating a molded interposer package, comprising: providing a metal sheet having a top surface and a bottom surface; performing a first anisotropic etching process to remove a portion of the metal sheet from the top surface of the metal sheet, thereby forming a plurality of first recesses in the metal sheet; forming a molding material covering the top surface of the metal sheet, filling the first recesses; forming a plurality of first via openings in the molding material, wherein the first via openings expose the top surface of the metal sheet; forming a plurality of first metal vias in the first via openings and a plurality of first redistribution layer patterns respectively on the first metal vias; performing a second anisotropic etching process to remove a portion of the metal sheet from the bottom surface of the metal sheet until a bottom of the molding material is exposed; and forming a solder mask layer on the molding material, leaving the first redistribution layer patterns exposed.
地址 Hsin-Chu TW