发明名称 SEMICONDUCTOR DEVICE HAVING A METAL PATTERN AND A PIEZOELECTRIC PATTERN
摘要 The present invention relates to a semiconductor device having a metal pattern and a piezoelectric pattern. More specifically a semiconductor device which includes: a passivation layer for defining a metal pattern on a first surface of a substrate; a minor insulation layer on a second surface of the substrate; and a piezoelectric pattern formed between the metal pattern and the passivation pattern, on the first surface of the substrate, is provided.
申请公布号 KR20150056298(A) 申请公布日期 2015.05.26
申请号 KR20130139140 申请日期 2013.11.15
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HONG, YI KOAN;PARK, BYUNG LYUL;PARK, JI SOON;CHOI, SI YOUNG
分类号 H01L41/312 主分类号 H01L41/312
代理机构 代理人
主权项
地址