SEMICONDUCTOR DEVICE HAVING A METAL PATTERN AND A PIEZOELECTRIC PATTERN
摘要
The present invention relates to a semiconductor device having a metal pattern and a piezoelectric pattern. More specifically a semiconductor device which includes: a passivation layer for defining a metal pattern on a first surface of a substrate; a minor insulation layer on a second surface of the substrate; and a piezoelectric pattern formed between the metal pattern and the passivation pattern, on the first surface of the substrate, is provided.
申请公布号
KR20150056298(A)
申请公布日期
2015.05.26
申请号
KR20130139140
申请日期
2013.11.15
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
HONG, YI KOAN;PARK, BYUNG LYUL;PARK, JI SOON;CHOI, SI YOUNG