RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, COMPOUND

摘要

The present invention relates to a resist composition which generates acid upon exposure, and exhibits solubility changed with respect to a developing solution under action of acid. The resist composition comprises a base component (A) which exhibits solubility changed with respect to a developing solution under action of acid. The base component (A) includes a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-0), wherein V^11 represents an aliphatic cyclic group with or without a substituent, R^1 represents a lactam-containing cyclic group or a sultam-containing cyclic group, Y^1 represents an oxygen atom (-O-), an ester bond (-C(-O)-O-) or a single bond, and W^2 represents a group formed by a polymerization reaction of a polymerizable group-containing group.