发明名称 A RESISTIVE RANDOM ACCESS MEMORY (RRAM) WITH IMPROVED FORMING VOLTAGE CHARACTERISTICS AND METHOD FOR MAKING
摘要 The present disclosure provides resistive random access memory (RRAM) structures and methods of making the same. The RRAM structures include a bottom electrode having protruded step portion that allows formation of a self-aligned conductive path with a top electrode during operation. The protruded step portion may have an inclination angle of about 30 degrees to 150 degrees. Multiple RRAM structures may be formed by etching through a RRAM stack.
申请公布号 KR20150056454(A) 申请公布日期 2015.05.26
申请号 KR20140145438 申请日期 2014.10.24
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHEN JONATHAN TEHAN;CHOU CHUNG CHENG;LEE PO HAO;TU KUO CHI
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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