| 发明名称 | Method of transferring graphene | ||
| 摘要 | A method of transferring graphene includes depositing graphene on a side of at least one metal substrate to provide a metal substrate-graphene layer, stacking a target substrate on a side of the metal substrate-graphene layer to provide a stacked structure in which a side of the target substrate faces the graphene layer, and exposing the stacked structure to an electrolysis bath to remove the metal substrate and transfer the graphene onto the side of the target substrate. | ||
| 申请公布号 | US9039886(B2) | 申请公布日期 | 2015.05.26 |
| 申请号 | US201213659355 | 申请日期 | 2012.10.24 |
| 申请人 | CHEIL INDUSTRIES, INC. | 发明人 | Gong Kuanping;Ci Lijie;Ahn Sung-Hee;Park Jin-Seong;Kim Byeong-Yeol |
| 分类号 | C25F5/00;B32B38/10;B32B38/00;C01B31/04;B32B37/06;B32B38/16 | 主分类号 | C25F5/00 |
| 代理机构 | Lee & Morse, P.C. | 代理人 | Lee & Morse, P.C. |
| 主权项 | 1. A method of transferring graphene, the method comprising: depositing graphene on a side of a metal substrate to provide a metal substrate-graphene layer; stacking a target substrate on the metal substrate-graphene layer to provide a stacked structure in which a side of the target substrate faces the graphene layer; and passing the stacked structure through an electrolysis bath to etch the metal substrate and transfer the graphene onto the side of the target substrate. | ||
| 地址 | Gumi-si, Kyeongsangbuk-do KR | ||