发明名称 Substrate processing apparatus, substrate processing method, and computer readable storage medium storing substrate processing program
摘要 Disclosed is a liquid processing apparatus capable of accurately determining a holding state of a substrate without being influenced by, for example, material or surface condition of a substrate. The liquid processing apparatus includes a substrate holding unit that holds a substrate, a camera that photographs a region where a peripheral edge portion of substrate is present when substrate is properly held by the substrate holding unit, and a control unit that determines a holding state of the substrate held by the substrate holding unit based on an image photographed by the camera.
申请公布号 US9039863(B2) 申请公布日期 2015.05.26
申请号 US201213677534 申请日期 2012.11.15
申请人 Tokyo Electron Limited 发明人 Matsumoto Shuhei;Iwanaga Shuji;Tomita Hiroshi;Nakamizo Kenji;Morita Satoshi
分类号 C23F1/00;H01L21/67;G05D3/00 主分类号 C23F1/00
代理机构 Abelman, Frayne & Schwab 代理人 Abelman, Frayne & Schwab
主权项 1. An apparatus for processing a substrate comprising: a substrate holding unit configured to hold a substrate; a processing liquid supply unit connected to a processing liquid supply source and configured to supply a processing liquid to the substrate; a camera configured to photograph a region where a peripheral edge portion of the substrate is present when the substrate is properly held by the substrate holding unit; and a control unit configured to determine whether the substrate is properly held by the substrate holding unit by comparing an image of an actual holding state of the substrate photographed by the camera with a reference image prepared in advance representing a normal holding state of the substrate in which the substrate is properly held by the substrate holding unit, wherein the control unit is further configured to calculate a coincidence ratio between the photographed image and the reference image, determine that the substrate is properly held by the substrate holding unit when the coincidence ratio is equal to or more than a predetermined value, and determine that the substrate is not properly held by the substrate holding unit when the coincidence ratio is less than the predetermined value.
地址 Tokyo JP