发明名称 Mask
摘要 A light irradiation apparatus and a method of manufacture a photo-aligning layer are disclosed. A mask included in a light irradiation apparatus according to one embodiment is configured to irradiate the light having straightness at a high level of illumination to a subject that is apart from the mask with a certain distance. A photo-aligning layer with a desired alignment pattern can be fabricated using the mask.
申请公布号 US9041993(B2) 申请公布日期 2015.05.26
申请号 US201113335126 申请日期 2011.12.22
申请人 LG CHEM, LTD. 发明人 Kim Sin Young;Hong Kyung Ki;Yoon Hyuk;Ju Won Cheul;Cho Yong Il;Park Moon Soo;Ko Dong Ho;Ryu Su Young
分类号 G02B5/00;G03F7/24;G02F1/1337 主分类号 G02B5/00
代理机构 McKenna Long & Aldridge LLP 代理人 McKenna Long & Aldridge LLP
主权项 1. A method of generating linearly progressing light, comprising: irradiating light toward a mask including at least one opening to guide the light to a subject; and guiding the light irradiated from the opening to the subject, wherein the opening is defined by the following Equation: 5a≦t  [Equation] (a: a distance between the mask and the subject, t: a thickness of the opening), wherein a size of the opening is adjusted according to the distance between the mask and the subject, wherein the subject has a curved surface, and wherein the curved surface of the subject has a curvature radius of 150 mm to 250 mm.
地址 Seoul KR