发明名称 |
Mask |
摘要 |
A light irradiation apparatus and a method of manufacture a photo-aligning layer are disclosed. A mask included in a light irradiation apparatus according to one embodiment is configured to irradiate the light having straightness at a high level of illumination to a subject that is apart from the mask with a certain distance. A photo-aligning layer with a desired alignment pattern can be fabricated using the mask. |
申请公布号 |
US9041993(B2) |
申请公布日期 |
2015.05.26 |
申请号 |
US201113335126 |
申请日期 |
2011.12.22 |
申请人 |
LG CHEM, LTD. |
发明人 |
Kim Sin Young;Hong Kyung Ki;Yoon Hyuk;Ju Won Cheul;Cho Yong Il;Park Moon Soo;Ko Dong Ho;Ryu Su Young |
分类号 |
G02B5/00;G03F7/24;G02F1/1337 |
主分类号 |
G02B5/00 |
代理机构 |
McKenna Long & Aldridge LLP |
代理人 |
McKenna Long & Aldridge LLP |
主权项 |
1. A method of generating linearly progressing light, comprising:
irradiating light toward a mask including at least one opening to guide the light to a subject; and guiding the light irradiated from the opening to the subject, wherein the opening is defined by the following Equation:
5a≦t [Equation] (a: a distance between the mask and the subject, t: a thickness of the opening), wherein a size of the opening is adjusted according to the distance between the mask and the subject, wherein the subject has a curved surface, and wherein the curved surface of the subject has a curvature radius of 150 mm to 250 mm. |
地址 |
Seoul KR |