发明名称 Fabrication of a magnetic tunnel junction device
摘要 A magnetic tunneling junction device and fabrication method is disclosed. In a particular embodiment, a non-transitory computer-readable medium includes processor executable instructions. The instructions, when executed by a processor, cause the processor to initiate deposition of a capping material on a free layer of a magnetic tunneling junction structure to form a capping layer. The instructions, when executed by the processor, cause the processor to initiate oxidization of a first layer of the capping material to form a first oxidized layer of oxidized material.
申请公布号 US9043740(B2) 申请公布日期 2015.05.26
申请号 US201314048918 申请日期 2013.10.08
申请人 QUALCOMM Incorporated 发明人 Lee Kangho;Zhu Xiaochun;Li Xia;Kang Seung Hyuk
分类号 G06F17/50;H01L43/02;B82Y25/00;B82Y40/00;H01F10/32;H01F41/30;H01F41/32;H01L43/08;H01L43/12;H01L27/22 主分类号 G06F17/50
代理机构 代理人 Min Donald D.
主权项 1. A non-transitory computer-readable medium comprising processor executable instructions that, when executed by a processor, cause the processor to: initiate deposition of a capping material on a free layer of a magnetic tunneling junction structure to form a capping layer; and initiate formation of a first oxidized layer of oxidized material on the capping layer, wherein the first oxidized layer is positioned further from the free layer than a second layer of the capping material.
地址 San Diego CA US