发明名称 |
Fabrication of a magnetic tunnel junction device |
摘要 |
A magnetic tunneling junction device and fabrication method is disclosed. In a particular embodiment, a non-transitory computer-readable medium includes processor executable instructions. The instructions, when executed by a processor, cause the processor to initiate deposition of a capping material on a free layer of a magnetic tunneling junction structure to form a capping layer. The instructions, when executed by the processor, cause the processor to initiate oxidization of a first layer of the capping material to form a first oxidized layer of oxidized material. |
申请公布号 |
US9043740(B2) |
申请公布日期 |
2015.05.26 |
申请号 |
US201314048918 |
申请日期 |
2013.10.08 |
申请人 |
QUALCOMM Incorporated |
发明人 |
Lee Kangho;Zhu Xiaochun;Li Xia;Kang Seung Hyuk |
分类号 |
G06F17/50;H01L43/02;B82Y25/00;B82Y40/00;H01F10/32;H01F41/30;H01F41/32;H01L43/08;H01L43/12;H01L27/22 |
主分类号 |
G06F17/50 |
代理机构 |
|
代理人 |
Min Donald D. |
主权项 |
1. A non-transitory computer-readable medium comprising processor executable instructions that, when executed by a processor, cause the processor to:
initiate deposition of a capping material on a free layer of a magnetic tunneling junction structure to form a capping layer; and initiate formation of a first oxidized layer of oxidized material on the capping layer, wherein the first oxidized layer is positioned further from the free layer than a second layer of the capping material. |
地址 |
San Diego CA US |