| 发明名称 | Etching solution compositions for metal laminate films | ||
| 摘要 | Disclosed are etching solution compositions that comprise fluorine compounds and iron ions, which are used for bulk etching of metal laminate films wherein a layer comprising aluminum or an aluminum alloy is laminated on top and a layer comprising titanium or a titanium alloy on bottom, and an etching method using said etching solution compositions. | ||
| 申请公布号 | US9039915(B2) | 申请公布日期 | 2015.05.26 |
| 申请号 | US201013201955 | 申请日期 | 2010.02.23 |
| 申请人 | Kanto Kagaku Kabushiki Kaisha | 发明人 | Kuroiwa Kenji;Nagashima Kazuaki;Kato Masaru;Nohara Masahiro |
| 分类号 | C03C25/68;C23F1/20;C23F1/26;C23F1/44;H01L21/3213 | 主分类号 | C03C25/68 |
| 代理机构 | Wolf, Greenfield & Sacks, P.C. | 代理人 | Wolf, Greenfield & Sacks, P.C. |
| 主权项 | 1. A method for one-time etching a metal laminate film in which a layer formed from aluminum or an aluminum alloy as an upper part and a layer formed from titanium or a titanium alloy as a lower part are laminated and which is formed on a glass substrate, the method using an etching solution composition comprising a fluorine compound and an iron ion, wherein a part of the layer formed from aluminum or an aluminum alloy is etched to expose the layer formed from titanium or a titanium alloy in the etching. | ||
| 地址 | Tokyo JP | ||