发明名称 PLASMA TREATMENT APPARATUS AND PLASMA TREATMENT METHOD
摘要 A main antenna connected to a high frequency power source, and an auxiliary antenna electrically insulated (in a state of floating) from corresponding the main antenna are disposed. Additionally, when viewing the main antenna and the auxiliary antenna at a plane, each projection area are adjusted not to be superposed. More specifically, the main antenna is disposed in a downstream side of the rotary direction of a rotary table. Then, an electromagnetic field is generated in the auxiliary antenna through an induction current flowing in the main antenna and the auxiliary antenna is resonated to generate inductive plasma not only in an area of a lower part of the main antenna but also in an area of a lower part of the auxiliary antenna.
申请公布号 KR20150056061(A) 申请公布日期 2015.05.22
申请号 KR20140158044 申请日期 2014.11.13
申请人 TOKYO ELECTRON LIMITED 发明人 KATO HITOSHI;MIURA SHIGEHIRO;KOSHIMIZU CHISHIO;YAMAWAKU JUN;YAMAZAWA YOHEI
分类号 H05H1/46;H01L21/205;H01L21/3065 主分类号 H05H1/46
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