METHOD FOR DETECTING THE DEFECT OF THE PATTERN

摘要

Provided is a method for detecting defect of a pattern. The method for detecting defect of the pattern comprises the steps of: obtaining a target layout image to a target pattern; obtaining a pattern image to a pattern on a substrate; extracting an edge image from the pattern image; forming a first vector form from the target layout image; forming a second vector form from the edge image; and comparing the first vector form and the second vector form.