| 发明名称 |
Target Point Generation for Optical Proximity Correction |
| 摘要 |
A method performed by a computer processing system includes receiving a design pattern for an integrated circuit, applying a function to the design pattern to generate a model contour, generating a plurality of Optical Proximity Correction (OPC) target points along the model contour, adjusting the design pattern to create an adjusted pattern, and performing a simulation on the adjusted pattern to create a simulated contour. |
| 申请公布号 |
US2015143304(A1) |
申请公布日期 |
2015.05.21 |
| 申请号 |
US201314081521 |
申请日期 |
2013.11.15 |
| 申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Chih Ming-Hui;Cheng Wen-Li;Tang Yu-Po;Wu Ping-Chieh;Chiang Chia-Ping;Lin Yong-Cheng;Huang Wen-Chun;Liu Ru-Gun |
| 分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method performed by a computer processing system, the method comprising:
with the computer processing system, receiving a design pattern for an integrated circuit; applying a function to the design pattern to generate a model contour, the model contour representing a desired printout of the design pattern; generating a plurality of Optical Proximity Correction (OPC) target points along the model contour; adjusting the design pattern to create an adjusted pattern; and performing a simulation on the adjusted pattern to create a simulated contour. |
| 地址 |
Hsin-Chu TW |
