ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

摘要

There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin containing a repeating unit represented by the first specific formula and a repeating unit represented by the second specific formula, wherein the content of the repeating unit represented by the first specific formula is 35 mol % or more based on all repeating units in the resin (A), a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition.

主权项

1. An actinic ray-sensitive or radiation-sensitive resin composition comprising:
(A) a resin containing a repeating unit represented by the following formula (1-1) and a repeating unit represented by the following formula (1-2), wherein the content of the repeating unit represented by the following formula (1-1) is 35 mol % or more based on all repeating units in the resin (A): wherein in formula (1-1), R1 represents an alkyl group or a cycloalkyl group, R2 represents an alkyl group or a cycloalkyl group, R3 represents a hydrogen atom or an alkyl group, R1 and R2 may combine to form a ring, Ra represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, and L1 represents a single bond or a divalent linking group; in formula (1-2), R4 represents a substituent, n1 represents 1 or 2, n2 represents an integer of 0 to 4, L2 represents a single bond, —COO— or —CONR5—, and R5 represents a hydrogen atom or an alkyl group.