发明名称 SUBSTRATE BONDING METHOD AND SUBSTRATE BONDING APPARATUS
摘要 According to one embodiment, there is provided a substrate bonding method. The substrate bonding method includes disposing a first substrate and a second substrate to face each other. The substrate bonding method includes controlling the first substrate and the second substrate to have a temperature difference. The substrate bonding method includes, in a state where the first substrate and the second substrate are controlled to have the temperature difference, bonding the first substrate to the second substrate by bringing the first substrate into contact with the second substrate while deforming the first substrate so that a central portion of the first substrate is projected toward the second substrate. The central portion of the first substrate is on an inner side of a peripheral portion of the first substrate.
申请公布号 US2015140689(A1) 申请公布日期 2015.05.21
申请号 US201414198339 申请日期 2014.03.05
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 ENDO Mitsuyoshi
分类号 H01L21/66;H01L21/67;H01L21/68 主分类号 H01L21/66
代理机构 代理人
主权项 1. A substrate bonding method comprising: disposing a first substrate and a second substrate to face each other; controlling the first substrate and the second substrate to have a temperature difference; and in a state where the first substrate and the second substrate are controlled to have the temperature difference, bonding the first substrate to the second substrate by bringing the first substrate into contact with the second substrate while deforming the first substrate so that a central portion of the first substrate is projected toward the second substrate, the central portion of the first substrate being on an inner side of a peripheral portion of the first substrate.
地址 TOKYO JP