发明名称 Semiconductor Device and Method of Forming a Shielding Layer Over a Semiconductor Die Disposed in a Cavity of an Interconnect Structure and Grounded Through the Die TSV
摘要 A semiconductor device has an interconnect structure with a cavity formed partially through the interconnect structure. A first semiconductor die is mounted in the cavity. A first TSV is formed through the first semiconductor die. An adhesive layer is deposited over the interconnect structure and first semiconductor die. A shielding layer is mounted over the first semiconductor die. The shielding layer is secured to the first semiconductor die with the adhesive layer and grounded through the first TSV and interconnect structure to block electromagnetic interference. A second semiconductor die is mounted to the shielding layer and electrically connected to the interconnect structure. A second TSV is formed through the second semiconductor die. An encapsulant is deposited over the shielding layer, second semiconductor die, and interconnect structure. A slot is formed through the shielding layer for the encapsulant to flow into the cavity and cover the first semiconductor die.
申请公布号 US2015137334(A1) 申请公布日期 2015.05.21
申请号 US201514600825 申请日期 2015.01.20
申请人 STATS ChipPAC, Ltd. 发明人 Lee SinJae;Kim JinGwan;Oh JiHoon;Lim JaeHyun;Lee KyuWon
分类号 H01L25/065;H01L23/552;H01L21/768;H01L21/56;H01L23/48;H01L25/00;H01L23/31 主分类号 H01L25/065
代理机构 代理人
主权项 1. A method of making a semiconductor device, comprising: providing a substrate including a cavity; disposing a first semiconductor die or component in the cavity of the substrate; disposing a planar shielding layer over the first semiconductor die or component electrically connected to the substrate; and disposing a second semiconductor die or component over the planar shielding layer.
地址 Singapore SG